• Imec developed a plasma-enhanced ALD process on 300mm silicon wafers for the growth of WS2 2D layers with controllable thickness.
  • The process uses convenient gas phase precursors WF6 and H2S and runs in a production platform (ASM Eagle 12_2)
  • The WS2 shows intense Raman spectroscopy features, characteristic for a 2D film
  • Transmission electron microscopy (TEM) shows a 3-5 monolayer thick film with a beautiful 2D layered structure
  • Plan-view TEM shows the crystalline structure of the 2D film
  • The layer is poly-crystalline with a grain-size of ~10-20nm